Growth and characterization of tin oxide films prepared by chemical vapour deposition
- 1 September 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 190 (2) , 287-301
- https://doi.org/10.1016/0040-6090(89)90918-8
Abstract
No abstract availableKeywords
This publication has 30 references indexed in Scilit:
- A method for the deposition of transparent conducting thin films of tin oxideThin Solid Films, 1985
- Transparent heat-reflecting coatings based on highly doped semiconductorsThin Solid Films, 1981
- In2O3 : (Sn) and SnO2 : (F) films - application to solar energy conversion part II — Electrical and optical propertiesMaterials Research Bulletin, 1979
- Mechanism of CVD Thin Film SnO2 FormationJournal of the Electrochemical Society, 1978
- Electrical Conductivity of Heat‐Treated SnO2 FilmsJournal of the American Ceramic Society, 1976
- Chemical Vapor Deposition of Antimony‐Doped Tin Oxide Films Formed from Dibutyl Tin DiacetateJournal of the Electrochemical Society, 1976
- Chemical Vapor Deposition of Transparent, Electrically Conductive Tin Oxide Films Formed from Dibutyl Tin DiacetateJournal of the Electrochemical Society, 1975
- Reactively Sputtered Oxide FilmsJournal of the Electrochemical Society, 1969
- Devitrification of Tin Oxide Films (Doped and Undoped) Prepared by Reactive SputteringJournal of the Electrochemical Society, 1965
- Preparation of Oxide Glass Films by Reactive SputteringJournal of the American Ceramic Society, 1963