Surface metrology instrumentation

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Abstract
Progress in the instrumentation required to measure surfaces effectively has, in the past, been severely restricted because of a number of problems. One has been a true understanding of surface function and another has been a limitation in data processing power and a third has been due to instrumental limitations. In the last few years these three factors have been, to a large extent, brought together by using random process analysis, digital methods and both contacting and noncontacting methods. The author explores these separate themes and shows how they are likely to merge today and in the future.

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