Modification of nickel silicide formation by oxygen implantation
- 1 May 1981
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 182-183, 655-660
- https://doi.org/10.1016/0029-554x(81)90792-8
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- An analytical study of platinum silicide formationThin Solid Films, 1976
- Effect of Oxidizing Ambients on Platinum Silicide Formation: II . Auger and Backscattering AnalysesJournal of the Electrochemical Society, 1975
- Structure and growth kinetics of Ni2Si on siliconThin Solid Films, 1975
- Cross sections for the O16(d, p0)O17, O16(d, p1O17∗ and O16(d, α0)N14 reactions from 0.8 to 1.7 MeVNuclear Physics, 1964