Determination of the optical constants (n, k) of thin dielectric films
- 1 March 1993
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 32 (7) , 1168-1172
- https://doi.org/10.1364/ao.32.001168
Abstract
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This publication has 18 references indexed in Scilit:
- A method for the measurement of thin film optical constants with a spectral photometer from 230 nm to 850 nm and its application to plasma silicon (oxy) nitrideThin Solid Films, 1991
- Optimizing deposition parameters of electron beam evaporated TiO_2 filmsApplied Optics, 1988
- Algebraic method for extracting thin-film optical parameters from spectrophotometer measurementsApplied Optics, 1983
- Determination of optical constants of absorbing materials using transmission and reflection of thin films on partially metallized substrates: analysis of the new (T,Rm) techniqueApplied Optics, 1981
- A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin filmJournal of Physics E: Scientific Instruments, 1976
- The determination of the refractive index and thickness of a transparent filmJournal of Physics D: Applied Physics, 1976
- The optical properties of thin films of tantalum pentoxide and zirconium dioxideThin Solid Films, 1975
- The optical constants of thin evaporated films of cadmium and zinc sulphidesJournal of Physics D: Applied Physics, 1975
- The determination of the optical constants of thin films from measurements of reflectance and transmittance at normal incidenceJournal of Physics D: Applied Physics, 1972
- Computational Method for Determining n and k for a Thin Film from the Measured Reflectance, Transmittance, and Film ThicknessApplied Optics, 1966