Microstructure and stability of rf-diode sputtered GdTbFeCo thin films

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Abstract
The correlation of deposition parameters, microstructure, and stability of rf-diode sputtered magneto-optical thin films has been studied by using transmission electron microscopy and a magneto-optical hysteresis loop tracer. Among the sputtering parameters, we found that both argon bleeding pressure and substrate bias have strong influences on microstructure and consequently the oxidation resistance of the films. Sputtering using moderate argon pressure and substrate bias produces dense and smooth films. The bare films are strongly resistant to oxidation. In contrast, low or high argon pressure and substrate table bias result in films of high porosity, columnar ‘‘islandlike’’ structure, or ‘‘spongelike’’ morphology. They degrade rapidly in air.