Auger electron spectroscopy study on the thermal stability of the Al/Al12W/W2N/Si contact system
- 1 January 1993
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 73 (1) , 185-188
- https://doi.org/10.1063/1.353881
Abstract
The thermal stability of the Al/Al12W/W2N/Si contact system has been studied using Auger electron spectroscopy analysis. The interposed Al12W layer between the Al overlayer and the W2N barrier layer effectively suppresses the possible spontaneous reaction between Al and W, which can be carried out by bringing about a chemical equilibrium state at each interface of Al/Al12W and Al12W/W2N. This is achieved by the successive combination of the thin‐film assembly; the materials bordering each other consist of one common constituent metal and form a compound at least on one side, which leads the interfaces to a lower free‐energy state, i.e., an equilibrium. It is shown that the present contact system tolerating heat treatment at temperatures up to 600 °C is one of the most stable multilayered configurations among those of Al metallization technology.This publication has 5 references indexed in Scilit:
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