Negative Ions in Low Pressure Discharges
- 1 January 1995
- journal article
- research article
- Published by Wiley in Contributions to Plasma Physics
- Vol. 35 (4-5) , 331-357
- https://doi.org/10.1002/ctpp.2150350404
Abstract
No abstract availableKeywords
This publication has 60 references indexed in Scilit:
- Multichannel quantum-defect theory of double-minimumstates in. I. Potential-energy curvesPhysical Review A, 1994
- FALP studies of electron attachment at elevated electron temperatures: the influence of attachment on electron energy distributionsInternational Journal of Mass Spectrometry and Ion Processes, 1993
- The Bohm criterion for radio-frequency discharges: A numerical verification based on Poisson’s equationPhysics of Fluids B: Plasma Physics, 1993
- The fullerenes: powerful carbon-based electron acceptorsPhilosophical Transactions A, 1993
- Studies of dissociative electron attachment to some haloethanes using the falp apparatus: comparisons with data obtained using non-thermal techniquesInternational Journal of Mass Spectrometry and Ion Processes, 1989
- Theoretical analysis of the electrode sheath in rf dischargesJournal of Applied Physics, 1989
- Studies of dissociative electron attachment to the free radicals CCl3 and CCl2Br using the FALP apparatusInternational Journal of Mass Spectrometry and Ion Processes, 1988
- Diffusion of positive and negative ions in the plasma produced by electron impactInternational Journal of Mass Spectrometry and Ion Processes, 1985
- Effect of temperature on the dissociative electron attachment to CClF3 and C2F6 a)The Journal of Chemical Physics, 1985
- Microwave ElectronicsReviews of Modern Physics, 1946