Amorphization implants and low temperature rapid thermal processing to form low sheet resistance, shallow junction, boron implanted layers
- 1 January 1987
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 21 (1-4) , 433-437
- https://doi.org/10.1016/0168-583x(87)90873-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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