Sheath properties of RF plasmas in a parallel-plate etch reactor; the low-frequency regime (ω<ωi)
- 14 July 1989
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 22 (7) , 925-932
- https://doi.org/10.1088/0022-3727/22/7/007
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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