Photoreflectance of AlxGa1−xAs and AlxGa1−xAs/GaAs interfaces and high-electron-mobility transistors
- 15 June 1990
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (12) , 7423-7429
- https://doi.org/10.1063/1.344532
Abstract
Photoreflectance is used to measure AlxGa1−xAs composition, and to determine carrier concentrations in Si-doped AlGaAs epilayers capped with GaAs. Undoped caps are generally depleted, and do not show a usual GaAs photoreflectance. However, photoreflectance from the cap/(doped AlGaAs) interface produces a broad signal which distorts the entire spectrum, making it hard to locate the GaAs and AlGaAs band edges precisely. A similar broad signal from modulation-doped heterostructures is apparently associated with samples that show the presence of two-dimensional electron gas.This publication has 16 references indexed in Scilit:
- Photoreflectance from GaAs and GaAs/GaAs interfacesPhysical Review B, 1989
- Atomic correlation energy differences by means of a polarization potentialPhysical Review A, 1988
- Electroreflectance and photoreflectance study of the space-charge region in semiconductors: (In-Sn-O)/InP as a model systemPhysical Review B, 1988
- Photoreflectance characterization of the space charge region in semiconductors: indium tin oxide on InP as a model systemSolar Cells, 1987
- Third-derivative modulation spectroscopy with low-field electroreflectanceSurface Science, 1973
- Schottky-Barrier Electroreflectance: Application to GaAsPhysical Review B, 1973
- Electro-Optic Functions for Interpretation of Experimental DataPhysical Review B, 1971
- Photoreflectance Line Shape at the Fundamental Edge in Ultrapure GaAsPhysical Review B, 1970
- Electric Field Effects on the Dielectric Constant of SolidsPhysical Review B, 1967
- Electric-Field Effects on Optical Absorption near Thresholds in SolidsPhysical Review B, 1966