Sudden onset of strong absorption followed by forced recovery in KrF laser-irradiated fused silica
- 15 March 1993
- journal article
- Published by Optica Publishing Group in Optics Letters
- Vol. 18 (6) , 453-455
- https://doi.org/10.1364/ol.18.000453
Abstract
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This publication has 10 references indexed in Scilit:
- Transient 210-nm absorption in fused silica induced by high-power UV laser irradiationOptics Letters, 1991
- Dispersive diffusive transport of free excitons in high purity silicaJournal of Non-Crystalline Solids, 1991
- Effect of intense and prolonged 248 nm pulsed-laser irradiation on the properties of ultraviolet-grade fused silicaApplied Physics Letters, 1991
- Optical Properties and Structure of Defects in Silica GlassJournal of the Ceramic Society of Japan, 1991
- Spatial distribution of defects in high-purity silica glassesJournal of Applied Physics, 1990
- Effects of excimer laser irradiation on the transmission, index of refraction, and density of ultraviolet grade fused silicaApplied Physics Letters, 1989
- Two-photon processes in defect formation by excimer lasers in synthetic silica glassApplied Physics Letters, 1988
- Dependence of the damage and transmission properties of fused silica fibers on the excimer laser wavelengthApplied Optics, 1988
- Mechanism of Intrinsic Si-Center Photogeneration in High-Purity SilicaPhysical Review Letters, 1988
- Vacuum-ultraviolet generation of luminescence and absorption centres in a-Sio2Philosophical Magazine Part B, 1984