Dependence of defect density and activation energy on deposition rates in silver films
- 16 November 1979
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 56 (1) , 195-198
- https://doi.org/10.1002/pssa.2210560120
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Annealing study of the electrical resistivity and defect density in silver filmsPhysica Status Solidi (a), 1978
- Annealing and thickness effects on the electrical resistance of vacuum-deposited tin antimonide alloy filmsThin Solid Films, 1974
- The ageing of thin films of nickel, cobalt and nickel-cobalt alloys in ultrahigh vacuumThin Solid Films, 1971
- Electrical Resistivity of Arc-evaporated Carbon FilmJournal of the Physics Society Japan, 1959
- Electrical Resistivity Study of Lattice Defects Introduced in Copper by 1.25-Mev Electron Irradiation at 80°KPhysical Review B, 1956
- Kinetics of Processes Distributed in Activation EnergyPhysical Review B, 1955
- Lattice Distortion Spectrum of Evaporated GoldJournal of Applied Physics, 1951
- Properties of Gold Deposited at Liquid Air TemperatureJournal of Applied Physics, 1949
- A theory of the irreversible electrical resistance changes of metallic films evaporated in vacuumProceedings of the Physical Society, 1943