Mechanical properties of hard W-C physically vapor deposited coatings in monolayer and multilayer configuration
- 1 December 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 290-291, 232-237
- https://doi.org/10.1016/s0040-6090(96)09177-8
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Tungsten and tungsten-carbon PVD multilayered structures as erosion-resistant coatingsSurface and Coatings Technology, 1993
- Elastic and viscoelastic analysis of stress in thin filmsJournal of Applied Physics, 1992
- The properties of W–C:H films deposited by reactive rf sputteringJournal of Materials Research, 1992
- Intrinsic stress in sputter-deposited thin filmsCritical Reviews in Solid State and Materials Sciences, 1992
- Stress-related effects in thin filmsThin Solid Films, 1989