Ion beam analysis of amorphous silicon films produced by magnetron sputtering
- 16 June 1984
- journal article
- structure
- Published by Wiley in Physica Status Solidi (a)
- Vol. 83 (2) , 437-443
- https://doi.org/10.1002/pssa.2210830203
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Hydrogen in amorphous siliconNuclear Instruments and Methods, 1981
- Technique for profiling 1H with 2.5-MeV Van de Graaff acceleratorsApplied Physics Letters, 1979
- Transport studies in doped amorphous siliconJournal of Non-Crystalline Solids, 1979
- Substitutional doping of amorphous siliconSolid State Communications, 1975