High resolution electron beam lithography studies on Shipley chemically amplified DUV resists
- 1 February 1997
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 35 (1-4) , 213-216
- https://doi.org/10.1016/s0167-9317(96)00083-4
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- High resolution studies on Hoechst AZ PN114 chemically amplified resistMicroelectronic Engineering, 1996