Fabrication of high density nanostructures gratings (>500Gbit/in2) used as molds for nanoimprint lithography
- 30 June 2000
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 53 (1-4) , 163-166
- https://doi.org/10.1016/s0167-9317(00)00287-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Large area high density quantized magnetic disks fabricated using nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Sub-10 nm monogranular metallic lines formed by 200 kV electron-beam lithography and lift-off in polymethylmethacrylate resistMicroelectronic Engineering, 1997
- Fabrication of 5–7 nm wide etched lines in silicon using 100 keV electron-beam lithography and polymethylmethacrylate resistApplied Physics Letters, 1993