A qualitative and quantitative study of the oxides of aluminum and silicon using AES and XPS
- 1 January 1985
- journal article
- Published by Elsevier in Journal of Electron Spectroscopy and Related Phenomena
- Vol. 35 (1) , 7-18
- https://doi.org/10.1016/0368-2048(85)80038-4
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Auger and photoelectron line energy relationships in aluminum–oxygen and silicon–oxygen compoundsJournal of Vacuum Science and Technology, 1982
- A simple background correction for AES peak height measurementsSurface and Interface Analysis, 1982
- Characterization of Catalytic Supports by Infrared Spectroscopy and ESCAApplied Spectroscopy, 1982
- Results of a joint auger/esca round robin sponsored by astm committee E-42 on surface analysis. Part II. Auger resultsJournal of Electron Spectroscopy and Related Phenomena, 1982
- Use of the oxygen KLL Auger lines in identification of surface chemical states by electron spectroscopy for chemical analysisAnalytical Chemistry, 1980
- A study of the charging and dissociation of SiO2 Surfaces by AESSurface Science, 1977
- A comparison of different spectrometers and charge corrections used in X-ray photoelectron spectroscopyJournal of Electron Spectroscopy and Related Phenomena, 1977
- Characterization of glass surfaces by electron spectroscopySurface Science, 1975
- Electron escape depth in siliconJournal of Electron Spectroscopy and Related Phenomena, 1974
- Binding energy shifts in the x-ray photoelectron spectra of a series of related Group IVa compoundsThe Journal of Physical Chemistry, 1973