Materials issues for optical components and photomasks in 157 nm lithography
- 1 November 1999
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 17 (6) , 3273-3279
- https://doi.org/10.1116/1.590994
Abstract
Photolithography using 157 nm pulsed fluorine lasers has emerged as the leading candidate technology for the post-193-nm generation. Preliminary data have indicated that at 157 nm there are optical materials transparent enough to enable the fabrication of refractive elements, both in the projection and illumination part of the optical train. However, a number of critical issues still remain. Optical materials must show no appreciable degradation with laser irradiation. The availability of transparent photomask substrates must be ascertained. Optical coatings must be developed and qualified. At this short wavelength, interface effects, subsurface damage, and adsorbate effects become increasingly prominent. We present recent experimental results on the durability tests of calcium fluoride, modified fused silica, and optical coatings for 157 nm applications. Our initial assessment of several grades of modified fused silica demonstrates that at least one grade already meets transparency and durability require...Keywords
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