Superconducting NbNxCy thin films fabricated with a dual ion-beam sputtering method
- 18 August 1986
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 49 (7) , 416-418
- https://doi.org/10.1063/1.97606
Abstract
We have fabricated refractory superconducting NbNxCy thin films on unheated Si substrates with a low‐energy dual ion‐beam sputtering technique. Films fabricated with this technique have predominantly B1 crystal structure with maximum Tc ∼13.2 K, resistivity of 80–150 μΩ cm and residual resistance ratio ∼1.0. The use of low ion‐beam energies and the absence of substrate heating make this method well suited for producing NbNxCy films for superconducting microelectronic applications.Keywords
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