Reactive film preparation

This publication has 16 references indexed in Scilit:

• Application of nematic liquid crystals for the investigation of p–n junctions and insulating layers
  Physica Status Solidi (a), 1972
• Some Properties of Silicon Nitride Films Produced by Radio Frequency Glow Discharge Reaction of Silane and Nitrogen
  Japanese Journal of Applied Physics, 1969
• The Preparation and Properties of Amorphous Silicon
  Journal of the Electrochemical Society, 1969
• Silicon oxide and nitride films deposited by an r.f. glow-discharge
  Thin Solid Films, 1968
• Vapor Deposition of Silicon Nitride Film on Silicon and Properties of MNS Diodes
  Japanese Journal of Applied Physics, 1968
• The Effects of Gas Pressure and Velocity on Epitaxial Silicon Deposition by the Hydrogen Reduction of Chlorosilanes†
  International Journal of Electronics, 1967
• The Preparation and Properties of Thin Film Silicon-Nitrogen Compounds Produced by a Radio Frequency Glow Discharge Reaction
  Journal of the Electrochemical Society, 1967
• Aspects physico-chimiques de la préparation de couches minces semiconductrices par condensation de plasmas froids
  Revue de Physique Appliquée, 1966
• Chemical vapour deposition promoted by r.f. discharge
  Solid-State Electronics, 1965
• Epitaxial Silicon Films by the Hydrogen Reduction of SiCl[sub 4]
  Journal of the Electrochemical Society, 1961