Silicon oxide and nitride films deposited by an r.f. glow-discharge
- 1 May 1968
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 1 (6) , 481-494
- https://doi.org/10.1016/0040-6090(68)90075-8
Abstract
No abstract availableThis publication has 11 references indexed in Scilit:
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