Influence of substrate material on the initial thin film growth during ion deposition from a glow discharge
- 30 November 1984
- Vol. 34 (10-11) , 969-973
- https://doi.org/10.1016/0042-207x(84)90180-5
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Self-limiting etch depths using simultaneous sputter etching/deposition techniqueJournal of Vacuum Science & Technology A, 1984
- Plasma etching—A discussion of mechanismsJournal of Vacuum Science and Technology, 1979
- 18. Initial etching in an rf butane plasmaVacuum, 1978