Transparent ZnO:Al films prepared by co-sputtering of ZnO:Al with either a Zn or an Al target
- 4 December 1996
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 290-291, 84-87
- https://doi.org/10.1016/s0040-6090(96)09127-4
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Preparation of conductive ZnO:Al films by a facing target system with a strong magnetic fieldThin Solid Films, 1994
- Substrate temperature dependence of electrical properties of ZnO:Al epitaxial films on sapphire (12̄10)Journal of Applied Physics, 1991
- Optical properties of sputter-deposited ZnO:Al thin filmsJournal of Applied Physics, 1988
- Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1985
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- Transparent and highly conductive films of ZnO prepared by rf reactive magnetron sputteringApplied Physics Letters, 1981