Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering
- 15 April 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 226 (1) , 156-160
- https://doi.org/10.1016/0040-6090(93)90222-b
Abstract
No abstract availableKeywords
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