Pulsed laser annealing of rf sputtered amorphous Si-H films doped with arsenic
- 1 April 1982
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 53 (4) , 3261-3266
- https://doi.org/10.1063/1.331029
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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