A simple method for the measurement of stress in evaporated thin films by real-time holographic interferometry
- 1 June 1978
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 51 (3) , 335-338
- https://doi.org/10.1016/0040-6090(78)90296-1
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Rapid in situ processing for real-time holographic interferometryJournal of Physics E: Scientific Instruments, 1973
- Detection of Strain in Evaporated Films by Wavefront ReconstructionJournal of Vacuum Science and Technology, 1967
- Stress in thin dielectric filmsMicroelectronics Reliability, 1963