A Correlation of the Chemistry with the Polymerization Rate in an rf Discharge of Methane
- 1 March 1976
- journal article
- Published by Taylor & Francis in Journal of Macromolecular Science: Part A - Chemistry
- Vol. 10 (3) , 473-482
- https://doi.org/10.1080/00222337608061193
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Radiation Fields of a Tapered Film and a Novel Film-to-Fiber CouplerIEEE Transactions on Microwave Theory and Techniques, 1975
- Mass-spectrometric ion sampling from reactive plasmas: III. Mixtures of vinyltrimethysilane and argon or heliumInternational Journal of Mass Spectrometry and Ion Physics, 1974
- Mass-spectrometric ion sampling from reactive plasmas II. Mixtures of vinyltrimethylsilane and argonInternational Journal of Mass Spectrometry and Ion Physics, 1973
- Mass-spectrometric ion sampling from reactive plasmas I. Apparatus for argon and reactive dischargesInternational Journal of Mass Spectrometry and Ion Physics, 1973
- Organosilicon Films Formed by an RF Plasma Polymerization ProcessJournal of the Electrochemical Society, 1972