Observation of the Surface and Structure of Very Thin Ti Film

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Abstract
Ti was deposited onto pyrex glass at room temperature under high vacuum pressure such as 5×10-10 torr; then film structures were observed with TEM and AES. It was found that at the early stage of deposition, the main component of the thin layer, whose thickness was up to about 80 Å, was TiO. However, in the thicker layer, the amount of TiO decreased, and the main component became Ti. Deposited Ti film formed an island state whose thickness was up to about 70 Å, and micro-crystallization began when the film reached about 400 Å at room temperature.

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