Nonplanar and noncontinuous buried layers of SiO2 in silicon formed by ion beam synthesis
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 766-769
- https://doi.org/10.1016/0168-583x(89)90294-2
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Dielectrically isolated silicon-on-insulator islands by masked oxygen implantationApplied Physics Letters, 1987
- Novel dielectric/silicon planar structures formed by ion beam synthesisNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- The evolution of the Si/SiO2 interface in buried oxide layers formed by high dose oxygen implantation into siliconNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1987
- SIMS and 18O tracer studies of the redistribution of oxygen in buried SiO 2 layers formed by high dose implantationNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980