Magnetron Enhanced Reactive Ion Etching in a Hexode System
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Decapsulation and Photoresist Stripping in Oxygen Microwave PlasmasJournal of the Electrochemical Society, 1982
- High-Rate Reactive Ion Etching of SiO2 Using a Magnetron DischargeJapanese Journal of Applied Physics, 1981
- Microwave Plasma EtchingJapanese Journal of Applied Physics, 1977
- Electrical Characterization of Radio-Frequency Sputtering Gas DischargeJournal of Vacuum Science and Technology, 1969