Comparative study of AZPF514 and UVIII chemically amplified resists for electron beam nanolithography
- 1 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4) , 255-258
- https://doi.org/10.1016/s0167-9317(99)00075-1
Abstract
No abstract availableKeywords
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- Characterization of AZ PN114 resist for high resolution using electron-beam and soft-x-ray projection lithographiesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Why bother with x-ray lithography?Published by SPIE-Intl Soc Optical Eng ,1992