Development of a fast and high resolution e-beam process for the fabrication of X-ray masks with CD of 0.15 μm
- 28 February 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 27 (1-4) , 417-420
- https://doi.org/10.1016/0167-9317(94)00137-j
Abstract
No abstract availableKeywords
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- Development of an electron-beam process for the fabrication of x-ray nanomasksJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Contrast Enhancement of SAL Resist by Reducing Residual Solvent at PrebakeJapanese Journal of Applied Physics, 1991
- Electron scattering effects in master mask fabrication by single layer process for submicron x-ray lithographyJournal of Vacuum Science & Technology B, 1989
- Point exposure distribution measurements for proximity correction in electron beam lithography on a sub-100 nm scaleJournal of Vacuum Science & Technology B, 1987