A quantitative method for characterizing the extent of Cu oxidation by variable exit angle ultrasoft x-ray fluorescence spectroscopy
- 1 January 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 37 (2) , 167-172
- https://doi.org/10.1016/0169-4332(89)90479-0
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Surface-film and interfacial analysis via variable grazing exit angle x-ray fluorescence spectrometryApplied Surface Science, 1988
- Multilayer thin film thickness determination with variable exit angle ultrasoft x‐ray fluorescence spectrometrySurface and Interface Analysis, 1987
- Some fundamental aspects of surface-film analysis with variable angle ultrasoft x-ray fluorescence spectrometryAnalytical Chemistry, 1984
- Preliminary Evaluation of Capabilities of Photoelectric Detection of High Resolution Molecular X-ray Fluorescence Spectra with a 5 M Grating Ultrasoft X-ray SpectrometerSpectroscopy Letters, 1983
- Low-energy x-ray interaction coefficients: Photoabsorption, scattering, and reflectionAtomic Data and Nuclear Data Tables, 1982
- Anomalous scattering of X-rays by total reflection in the L-edge regions of iron and copperJournal of Physics C: Solid State Physics, 1981
- Changes in the Soft X-Ray L Emission Spectra with Oxidation of the First Series Transition MetalsJournal of Applied Physics, 1965