Self-aligned 3D shadow mask technique for patterning deeply recessed surfaces of micro-electro-mechanical systems devices
- 1 August 1999
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 76 (1-3) , 329-334
- https://doi.org/10.1016/s0924-4247(98)00286-6
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- High-resolution shadow-mask patterning in deep holes and its application to an electrical wafer feed-throughSensors and Actuators A: Physical, 1996
- Photolithography on micromachined 3D surfaces using electrodeposited photoresistsSensors and Actuators A: Physical, 1995
- Micromachined hall elements for two-dimensional magnetic-field sensingSensors and Actuators A: Physical, 1994