Direct UV writing of buried singlemode channelwaveguides in Ge-doped silica films
- 18 August 1994
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 30 (17) , 1401-1403
- https://doi.org/10.1049/el:19940935
Abstract
Germanosilicate film waveguides fabricated by plasma enhanced chemical vapour deposition have been shown to possess high sensitivity towards UV induced index changes. As an illustration of possible future applications, direct point-to-point writing of buried singlemode channel waveguides using a focused, continuous wave, UV laser beam is demonstrated.Keywords
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