Sputter deposition of ferroelectric PbTiO3thin films
- 1 February 1994
- journal article
- research article
- Published by Taylor & Francis in Ferroelectrics
- Vol. 152 (1) , 1-6
- https://doi.org/10.1080/00150199408017587
Abstract
PbTiO3 thin films were prepared by RF magnetron sputtering on MgO(100) single crystals as well as on polycrystalline platinum substrates. Highly epitaxial c-axis oriented films were grown on MgO(100). The effects of various sputtering parameters on the growth of films were investigated. The favorable conditions for the fabrication of epitaxial films were identified. Fully-perovskite PbTiO3 thin films could be obtained by crystallizing amorphous films grown on platinum substrates. The crystallization kinetics were measured isothermally at 475°C. The crystallized films were consisted of very fine grains oriented randomly. No evidence of 90°-domain boundaries could be found.Keywords
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