Photoluminescence from sub-nanometer-thick GaN/Al0.8Ga0.2N quantum wells
- 22 August 2000
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 77 (9) , 1336-1338
- https://doi.org/10.1063/1.1290151
Abstract
Photoluminescence (PL) spectra were measured for sub-nanometer-thick GaN quantum wells (QWs) with barriers, which were grown by atmospheric-pressure metal–organic chemical-vapor deposition. The thickness of the GaN QW layers was systematically varied from 1 to 4 ML. We clearly observed a PL peak at room temperature at a wavelength as short as 247 nm (5.03 eV) from 1-ML-thick QWs. The effective confinement energy, or difference between this recombination energy and the band gap of bulk GaN, is as large as 1.63 eV.
Keywords
This publication has 13 references indexed in Scilit:
- Time-resolved photoluminescence as a probe of internal electric fields in GaN-(GaAl)N quantum wellsPhysical Review B, 1999
- Giant electric fields in unstrained GaN single quantum wellsApplied Physics Letters, 1999
- Observation of long-lived oblique excitons in GaN-AlGaN multiple quantum wellsPhysical Review B, 1999
- Piezoelectric effects on the optical properties of GaN/AlxGa1−xN multiple quantum wellsApplied Physics Letters, 1998
- Plasma heating in highly excited GaN/AlGaN multiple quantum wellsApplied Physics Letters, 1998
- GaN/Al x Ga 1−x N quantum wells grown by molecular beam epitaxy with thickness control at the monolayer scaleApplied Physics Letters, 1998
- Reduction of oscillator strength due to piezoelectric fields in quantum wellsPhysical Review B, 1998
- Exciton-phonon interaction in InGaN/GaN and GaN/AlGaN multiple quantum wellsApplied Physics Letters, 1997
- Optical transitions in GaN/AlxGa1−xN multiple quantum wells grown by molecular beam epitaxyApplied Physics Letters, 1996
- Properties of a Si doped GaN/AlGaN single quantum wellApplied Physics Letters, 1995