Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films
- 1 November 1987
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 62 (9) , 3980-3981
- https://doi.org/10.1063/1.339197
Abstract
A study of the etching and deposition of plasma perfluoropolymer thin films has been carried out by using quartz-crystal microbalance methods for a range of feed gas mixtures.This publication has 9 references indexed in Scilit:
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