Thin films prepared by plasma polymerization of methyl-methacrylate and their properties as an electron beam resist
- 1 May 1983
- Vol. 33 (5) , 253-254
- https://doi.org/10.1016/0042-207x(83)90088-x
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Vacuum lithography using plasma polymerization and plasma developmentThin Solid Films, 1981
- Plasma polymerization of fluorocarbons in rf capacitively coupled diode systemJournal of Vacuum Science and Technology, 1981
- Plasma polymerized methyl-methacrylate as an electron-beam resistJournal of Applied Physics, 1980
- Polymeric Resists for X-Ray LithographyJournal of the Electrochemical Society, 1974
- Polymerization in radio frequency glow discharges—IEuropean Polymer Journal, 1972
- Polymerization in a Glow DischargeNature, 1966