Epitaxial Growth of Nitrides in Ti Implanted with N
- 15 August 1988
- journal article
- Published by IOP Publishing in Europhysics Letters
- Vol. 6 (8) , 689-694
- https://doi.org/10.1209/0295-5075/6/8/004
Abstract
The successive changes of structure of titanium implanted with nitrogen ions have been investigated via in situ transmission electron microscopy (TEM) under ultrahigh vacuum, using the microscope on line with our implantor. This facility allowed us to observe phases and orientation relationships which have not been previously reported. The similarity of the Ti sublattices in the Ti2N, TiN nitrides and in the host metal induces a simple epitaxy between close-packing planes and directions.Keywords
This publication has 7 references indexed in Scilit:
- Study of the correlation between hardness and structure of nitrogen-implanted titanium surfacesJournal of Materials Science, 1987
- High fluence implantation of nitrogen ions into titaniumMaterials Science and Engineering, 1985
- The subsurface microstructure of nitrogen-implanted metalsMaterials Science and Engineering, 1985
- Transmission electron microscopy study of ion implantation induced Si amorphizationNuclear Instruments and Methods in Physics Research, 1983
- In Situ Study of Implantation-Induced Silican AmorphisationIEEE Transactions on Nuclear Science, 1983
- A Monte Carlo computer program for the transport of energetic ions in amorphous targetsNuclear Instruments and Methods, 1980
- Structural Studies on the Titanium-Nitrogen System.Acta Chemica Scandinavica, 1962