Depth resolution of sputter profiling investigated by combined Auger-x-ray analysis of thin films
- 15 January 1980
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 168 (1-3) , 395-398
- https://doi.org/10.1016/0029-554x(80)91282-3
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- The depth resolution of sputter profilingApplied Physics A, 1979
- The determination of electron mean free paths in solids by depth and angular dependences of inelastically scattered electron spectraSurface Science, 1978
- New studies of the Si-SiO2 interface using auger sputter profilingSolid State Communications, 1978
- High resolution Auger sputter profiling study of the effect of phosphorus pileup on the Si–SiO2 interface morphologyJournal of Vacuum Science and Technology, 1978
- Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline TargetsPhysical Review B, 1969