Angle-resolved X-ray photoelectron spectroscopy (ARXPS) and a modified Levenberg-Marquardt fit procedure: a new combination for modeling thin layers
- 1 August 1990
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 45 (1) , 37-48
- https://doi.org/10.1016/0169-4332(90)90018-u
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Model of Si–SiO2 interfaces based on ARXPS measurementsJournal of Materials Research, 1988
- Proper choice of the error function in modeling spectroellipsometric dataApplied Optics, 1986
- Quantitative surface analysis by XPS: A comparison among different quantitative approachesSurface and Interface Analysis, 1985
- Influence of elastic and inelastic scattering on energy spectra of electrons emitted from solidsPhysical Review B, 1982
- Electron inelastic mean free paths in several solids for 200 eV ⩽ E ⩽ 10 keVSurface and Interface Analysis, 1982
- Thickness measurements on layered materials in powder form by means of XPS and ion sputteringSurface and Interface Analysis, 1979
- Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solidsSurface and Interface Analysis, 1979
- Theoretical equations for photoionization cross sections of polyatomic molecules in plane-wave and orthogonalized plane-wave approximationsThe Journal of Chemical Physics, 1974
- Ultrasoft-X-Ray Reflection, Refraction, and Production of Photoelectrons (100-1000-eV Region)Physical Review A, 1972
- High-Resolution X-Ray Photoemission Spectrum of the Valence Bands of GoldPhysical Review B, 1972