The recrystalization of BF2+-implanted silicon by light-flash annealing
- 31 July 1982
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 25 (7) , 559-563
- https://doi.org/10.1016/0038-1101(82)90056-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Sheet resistivity and transmission electron microscope investigations of BF+2 -implanted siliconJournal of Applied Physics, 1981
- Factors influencing the formation and growth of faulted loops in BF+2 -implanted siliconJournal of Applied Physics, 1981
- Light-flash induced metallic silicides from titanium films on siliconApplied Physics Letters, 1981
- The plasma z-pinch effect on the I-V characteristic of fast discharge flash tubesJournal of Applied Physics, 1980
- Arc annealing of BF+2 implanted silicon by a short pulse flash lampApplied Physics Letters, 1980
- Thermally assisted flash annealing of silicon and germaniumApplied Physics Letters, 1978