Rapid isothermal processing of strained GeSi layers
- 1 January 1992
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 39 (1) , 56-63
- https://doi.org/10.1109/16.108212
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
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