Chemical vapour deposition of Cu2O and CuO from CuI and O2 or N2O
- 31 January 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 78 (1-3) , 263-273
- https://doi.org/10.1016/0257-8972(95)02415-8
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Mercury-sensitized photo-induced chemical vapor deposition of YBa2Cu3Ox filmsPhysica C: Superconductivity and its Applications, 1991
- Chemical Vapor Deposition of CuOx Films by Cul and O2: Role of Cluster Formation on Film MorphologyJournal of the American Ceramic Society, 1991
- Sequential self-limiting growth of CuO on MgO(100) by chemical vapor depositionJournal of Crystal Growth, 1991
- Influence of water vapor on the morphology of Cu(II)O films produced by MOCVDMaterials Research Bulletin, 1989
- Thermodynamic investigation of CVD of the superconducting phase in the Bi-Sr-Ca-Cu-O system using halide precursorsJournal of Crystal Growth, 1989
- Thermodynamic investigation of CVD of the superconducting YBa2Cu3O7−x phase using halide precursorsJournal of Crystal Growth, 1989
- Preparation and characterization of thin films of copper(II) oxide by low temperature normal pressure metalorganic chemical vapor depositionMaterials Research Bulletin, 1989
- Abscheidung von Cu2O aus der Gasphase im strömenden MediumCrystal Research and Technology, 1977
- Mass spectrometric study of the vaporization of cuprous iodideThe Journal of Physical Chemistry, 1972
- Shock Tube Technique in Chemical KineticsAnnual Review of Physical Chemistry, 1969