Mercury-sensitized photo-induced chemical vapor deposition of YBa2Cu3Ox films
- 2 December 1991
- journal article
- Published by Elsevier in Physica C: Superconductivity and its Applications
- Vol. 190 (1-2) , 151-153
- https://doi.org/10.1016/s0921-4534(05)80233-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- The Effect of Microwave-Plasma on Decomposition and Oxidation of Ba(THD)2Japanese Journal of Applied Physics, 1991
- Photo Chemical Vapor Deposition of Metal Oxide Films Relating to Bi-Sr-Ca-Cu-O SuperconductorJapanese Journal of Applied Physics, 1991
- Excimer Laser-Assisted Chemical Vapor Deposition of Metal-Oxide Thin Film from β-Diketone ComplexesJapanese Journal of Applied Physics, 1991
- Low-temperature i n s i t u formation of Y-Ba-Cu-O high T c superconducting thin films by plasma-enhanced metalorganic chemical vapor depositionApplied Physics Letters, 1990