Dependence of the hardness of titanium nitride prepared by plasma chemical vapour deposition on the gas flow rate and the r.f. power
- 1 March 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 137 (1) , L49-L50
- https://doi.org/10.1016/0040-6090(86)90205-1
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−xThin Solid Films, 1981
- Titanium nitride deposition in an r.f. dischargeJournal of the Less Common Metals, 1980