β -phase tungsten nanorod formation by oblique-angle sputter deposition
- 7 October 2003
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 83 (15) , 3096-3098
- https://doi.org/10.1063/1.1618944
Abstract
We report the creation of an unusual simple cubic β-phase W(100) nanorods with a pyramidal tip having four (110) facets using an oblique-angle sputter deposition technique with substrate rotation (also known as glancing-angle deposition). During the oblique-angle deposition, both β-phase W(100) and α-phase W(110) islands exist at the initial stages of growth. The β-phase W(100) islands grow taller due to the lower adatom mobility on these islands. The taller islands survive in the competition and form isolated nanorods in the later stages of growth. This is in contrast to the sputter deposition at normal incidence, where only the thermodynamically stable bcc α-phase W(110) polycrystalline films were formed when the film grows to a certain thickness.Keywords
This publication has 15 references indexed in Scilit:
- Phase transformation of thin sputter-deposited tungsten films at room temperatureJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2002
- P‐45: Characterization of Tungsten Nanowire Emitter Grown by Self‐catalytic FunctionSID Symposium Digest of Technical Papers, 2002
- All-metallic three-dimensional photonic crystals with a large infrared bandgapNature, 2002
- Influences of oxygen on the formation and stability of A15 β-W thin filmsMaterials Science and Engineering: A, 2000
- Phase transformation of sputter deposited tungsten thin films with A-15 structureJournal of Applied Physics, 1996
- Structure and stability of sputter deposited beta-tungsten thin filmsApplied Physics Letters, 1994
- Characterization of sputter deposited tungsten films for x-ray multilayersJournal of Vacuum Science & Technology A, 1992
- The origin of stress in sputter-deposited tungsten films for x-ray masksJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- A comparison of tungsten film deposition techniques for very large scale integration technologyThin Solid Films, 1987
- Tungsten metallization for LSI applicationsJournal of Vacuum Science and Technology, 1974