Preparation of Nanocrystalline Silicon by Pulsed Plasma Processing

This publication has 12 references indexed in Scilit:

• Preparation of monodispersed colloidal particles
  Published by Elsevier ,2003
• Selective Etching of Hydrogenated Amorphous Silicon by Hydrogen Plasma
  Japanese Journal of Applied Physics, 1994
• Frequency effects in processing plasmas of the VHF band
  Plasma Sources Science and Technology, 1993
• Controlling the Solid-Phase Nucleation of Amorphous Si by Means of a Substrate Step Structure and Local Phosphorus Doping
  Japanese Journal of Applied Physics, 1993
• Role of Hydrogen Radical Treatment in Nucleation of Nanocrystalline Silicon
  Japanese Journal of Applied Physics, 1992
• Growth Mechanism of Microcrystalline Silicon Prepared by Alternating Deposition of Amorphous Silicon and Hydrogen Radical Annealing
  Japanese Journal of Applied Physics, 1992
• Preparation of Microcrystalline Silicon Films by Very-High-Frequency Digital Chemical Vapor Deposition
  Japanese Journal of Applied Physics, 1992
• Quantum size effects on photoluminescence in ultrafine Si particles
  Applied Physics Letters, 1990
• The adsorption of hydrogen on Si(111)-7×7 as studied by multiple internal reflection spectroscopy
  The Journal of Chemical Physics, 1989
• Growth Kinetics of Silicon Thin Film Studied by Hydrogen Radical and Ion Irradiation
  Japanese Journal of Applied Physics, 1989