Dielectric breakdown and reliability of MOS microstructures: Traditional characterization and low-frequency noise measurements
- 1 March 1995
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 35 (3) , 529-537
- https://doi.org/10.1016/0026-2714(95)93073-j
Abstract
No abstract availableKeywords
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